JPH03783B2 - - Google Patents
Info
- Publication number
- JPH03783B2 JPH03783B2 JP55140334A JP14033480A JPH03783B2 JP H03783 B2 JPH03783 B2 JP H03783B2 JP 55140334 A JP55140334 A JP 55140334A JP 14033480 A JP14033480 A JP 14033480A JP H03783 B2 JPH03783 B2 JP H03783B2
- Authority
- JP
- Japan
- Prior art keywords
- rectangular substrate
- cassette
- glass substrate
- opening
- arm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55140334A JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55140334A JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5764930A JPS5764930A (en) | 1982-04-20 |
JPH03783B2 true JPH03783B2 (en]) | 1991-01-08 |
Family
ID=15266402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55140334A Granted JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5764930A (en]) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5981074A (ja) * | 1982-10-30 | 1984-05-10 | 住友金属鉱山株式会社 | 板状体自動供給装置 |
JP2514214B2 (ja) * | 1987-09-18 | 1996-07-10 | オリンパス光学工業株式会社 | ウエハ取出し収納装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5032767U (en]) * | 1973-07-20 | 1975-04-09 | ||
JPS5116572A (ja) * | 1974-07-30 | 1976-02-09 | Mitsubishi Heavy Ind Ltd | Ritsutaijidosoko |
JPS573741Y2 (en]) * | 1978-12-22 | 1982-01-23 |
-
1980
- 1980-10-07 JP JP55140334A patent/JPS5764930A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5764930A (en) | 1982-04-20 |
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